Analysis of spatial pseudodepolarizers in imaging systems

JP McGuire Jr, RA Chipman - Optical Engineering, 1990 - spiedigitallibrary.org
The objective of a number of optical instruments is to measure the intensity accurately
without bias as to the incident polarization state. One method to overcome polarization bias …

Quaternion algebra for Stokes–Mueller formalism

E Kuntman, MA Kuntman, A Canillas, O Arteaga - JOSA A, 2019 - opg.optica.org
In this paper, we show that the Stokes–Mueller formalism can be reformulated in terms of
quaternions and that the quaternion algebra is a suitable alternative presentation of the …

Effects of polarization aberrations in an unobscured off-axis space telescope on its PSF ellipticity

J Luo, XU He, K Fan, X Zhang - Optics Express, 2020 - opg.optica.org
Polarization aberrations exist in almost all astronomical telescopes. Polarization aberrations
would bring about asymmetric apodization in the exit pupil, leading to asymmetric PSFs. The …

Suppressing the polarization aberrations by combining reflection and refraction optical groups

C Jiang, D Yao, L Meng, C Yan, H Shen - Optics express, 2022 - opg.optica.org
Polarization remote sensing technology expands the dimensions of the target and enriches
its basic information over traditional remote sensing methods. During the imaging process …

Polarization aberration diagrams

RA Chipman, LJ Chipman - Optical Engineering, 1989 - spiedigitallibrary.org
Polarization aberrations are variations of the polarization associated with different ray paths
through an optical system. This paper presents particular polarization aberration expansion …

Modified heterodyne efficiency for coherent laser communication in the presence of polarization aberrations

Y Yang, C Yan, C Hu, C Wu - Optics express, 2017 - opg.optica.org
Heterodyne efficiency is referred as a measure of the quality for the coherent laser
communication. The heterodyne efficiency not only reflects the matching of phase and …

Dielectric tensor measurement from a single Mueller matrix image

NA Beaudry, Y Zhao, R Chipman - JOSA A, 2007 - opg.optica.org
A technique for measuring dielectric tensors in anisotropic layered structures, such as thin
films of biaxial materials, is demonstrated. The ellipsometric data are collected in a quasi …

Polarization aberration analysis in optical lithography systems

J Kye, G McIntyre, Y Norihiro… - Optical …, 2006 - spiedigitallibrary.org
The use of immersion technology extends the lifetime of optical lithography by enabling ultra-
high NA much greater than 1.0. Ultra-high NA application for low k 1 imaging strongly …

Polarization aberration analysis using Pauli-Zernike representation

N Yamamoto, J Kye… - Optical Microlithography …, 2007 - spiedigitallibrary.org
Polarized illumination is a viable technique for improving the image quality and process
latitude of hyper-NA lithography. On investigation of polarization effects, it is often assumed …

Comparisons between an on-axis three-mirror anastigmat telescope and an off-axis one: polarization aberrations

J Luo, C You, X He, X Zhang - Applied Optics, 2021 - opg.optica.org
Due to the ability to achieve a wide-diffraction-limited field of view, three-mirror anastigmat
(TMA) telescopes are widely used in many applications that demand high imaging quality …