[HTML][HTML] Anisotropic and low damage III-V/Ge heterostructure etching for multijunction solar cell fabrication with passivated sidewalls
M de Lafontaine, E Pargon, G Gay… - Micro and Nano …, 2021 - Elsevier
This article presents a complete plasma etching process to etch high aspect ratio patterns on
III-V/Ge solar cell heterostructure with low damage for the fabrication of multijunction solar …
III-V/Ge solar cell heterostructure with low damage for the fabrication of multijunction solar …
[PDF][PDF] Anisotropic and low damage III-V/Ge heterostructure etching for multijunction solar cell fabrication with passivated sidewalls
M de Lafontaine, E Pargon, C Petit-Etienne… - Micro and Nano …, 2021 - hal.science
This article presents a complete plasma etching process to etch high aspect ratio patterns on
III-V/Ge solar cell heterostructure with low damage for the fabrication of multijunction solar …
III-V/Ge solar cell heterostructure with low damage for the fabrication of multijunction solar …
Anisotropic and low damage III-V/Ge heterostructure etching for multijunction solar cell fabrication with passivated sidewalls
M de Lafontaine, E Pargon, G Gay… - Micro and Nano …, 2021 - hal.science
This article presents a complete plasma etching process to etch high aspect ratio patterns on
III-V/Ge solar cell heterostructure with low damage for the fabrication of multijunction solar …
III-V/Ge solar cell heterostructure with low damage for the fabrication of multijunction solar …