MR Baklanov, JF Marneffe, D Shamiryan… - Journal of Applied …, 2013 - inis.iaea.org
[en] This paper presents an in-depth overview of the present status and novel developments in the field of plasma processing of low dielectric constant (low-k) materials developed for …
MR Baklanov, JF de Marneffe, D Shamiryan… - Journal of Applied …, 2013 - cir.nii.ac.jp
抄録< jats: p> This paper presents an in-depth overview of the present status and novel developments in the field of plasma processing of low dielectric constant (low-k) materials …
MR Baklanov, JF Marneffe, D Shamiryan… - Journal of Applied …, 2013 - osti.gov
This paper presents an in-depth overview of the present status and novel developments in the field of plasma processing of low dielectric constant (low-k) materials developed for …
MR Baklanov, JF de Marneffe, D Shamiryan… - JOURNAL OF …, 2013 - academia.edu
Plasma processing of low-k dielectrics Page 1 Plasma processing of low-k dielectrics Mikhail R. Baklanov, Jean-Francois de Marneffe, Denis Shamiryan, Adam M. Urbanowicz …
MR Baklanov, JF de Marneffe… - Journal of Applied …, 2013 - ui.adsabs.harvard.edu
This paper presents an in-depth overview of the present status and novel developments in the field of plasma processing of low dielectric constant (low-k) materials developed for …