Plasma processing of low-k dielectrics

MR Baklanov, JF de Marneffe, D Shamiryan… - Journal of Applied …, 2013 - pubs.aip.org
This paper presents an in-depth overview of the present status and novel developments in
the field of plasma processing of low dielectric constant (low-k) materials developed for …

Plasma processing of low-k dielectrics

MR Baklanov, JF Marneffe, D Shamiryan… - Journal of Applied …, 2013 - inis.iaea.org
[en] This paper presents an in-depth overview of the present status and novel developments
in the field of plasma processing of low dielectric constant (low-k) materials developed for …

Plasma processing of low-k dielectrics

MR Baklanov, JF de Marneffe, D Shamiryan… - Journal of Applied …, 2013 - cir.nii.ac.jp
抄録< jats: p> This paper presents an in-depth overview of the present status and novel
developments in the field of plasma processing of low dielectric constant (low-k) materials …

Plasma processing of low-k dielectrics

MR Baklanov, JF Marneffe, D Shamiryan… - Journal of Applied …, 2013 - osti.gov
This paper presents an in-depth overview of the present status and novel developments in
the field of plasma processing of low dielectric constant (low-k) materials developed for …

[PDF][PDF] Plasma processing of low-k dielectrics

MR Baklanov, JF de Marneffe, D Shamiryan… - JOURNAL OF …, 2013 - academia.edu
Plasma processing of low-k dielectrics Page 1 Plasma processing of low-k dielectrics
Mikhail R. Baklanov, Jean-Francois de Marneffe, Denis Shamiryan, Adam M. Urbanowicz …

[引用][C] Plasma processing of low-k dielectrics

M Baklanov, JF de Marneffe, D Shamiryan… - 2013 - imec-publications.be
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Plasma processing of low-k dielectrics

MR Baklanov, JF de Marneffe, D Shamiryan… - Journal of Applied …, 2013 - pubs.aip.org
APPLIED PHYSICS REVIEWS—FOCUSED REVIEW Plasma processing of low-k dielectrics
Page 1 APPLIED PHYSICS REVIEWS—FOCUSED REVIEW Plasma processing of low-k …

Plasma processing of low-k dielectrics

MR Baklanov, JF de Marneffe… - Journal of Applied …, 2013 - ui.adsabs.harvard.edu
This paper presents an in-depth overview of the present status and novel developments in
the field of plasma processing of low dielectric constant (low-k) materials developed for …

[引用][C] Plasma processing of low-k dielectrics

MR Baklanov, JF De Marneffe, D Shamiryan… - Journal of Applied …, 2013 - elibrary.ru