“Virtual IED sensor” at an rf-biased electrode in low-pressure plasma

MA Bogdanova, DV Lopaev, SM Zyryanov… - Physics of …, 2016 - pubs.aip.org
Energy distribution and the flux of the ions coming on a surface are considered as the key-
parameters in anisotropic plasma etching. Since direct ion energy distribution (IED) …
被引用次数：22 相关文章
[PDF] researchgate.net

[PDF][PDF] “Virtual IED sensor” at an rf-biased electrode in low-pressure plasma

MA Bogdanova, DV Lopaev, SM Zyryanov… - Physics of …, 2016 - researchgate.net
Energy distribution and the flux of the ions coming on a surface are considered as the
keyparameters in anisotropic plasma etching. Since direct ion energy distribution (IED) …

[引用][C] " virtual IED sensor" at an rf-biased electrode in low-pressure plasma

MA Bogdanova, DV Lopaev, SM Zyryanov… - Physics of Plasmas, 2016 - elibrary.ru
This research is supported by Russian Science Foundation (RSF) Grant No. 14-12-01012.
The authors are grateful to Zotovich Alexey for help with mass-spectrometric measurements …

“Virtual IED sensor” at an rf-biased electrode in low-pressure plasma

MA Bogdanova, DV Lopaev, SM Zyryanov… - Physics of …, 2016 - pubs.aip.org
Energy distribution and the flux of the ions coming on a surface are considered as the
keyparameters in anisotropic plasma etching. Since direct ion energy distribution (IED) …

Virtual IED sensor at an rf-biased electrode in low-pressure plasma

M Bogdanova, D Lopaev, S Zyryanov… - APS Annual …, 2016 - ui.adsabs.harvard.edu
The majority of present-day technologies resort to ion-assisted processes in rf low-pressure
plasma. In order to control the process precisely, the energy distribution of ions (IED) …

“Virtual IED sensor” at an rf-biased electrode in low-pressure plasma

MA Bogdanova, SM Zyryanov, DV Lopaev… - Physics of …, 2016 - inis.iaea.org
[en] Energy distribution and the flux of the ions coming on a surface are considered as the
key-parameters in anisotropic plasma etching. Since direct ion energy distribution (IED) …

Virtual IED sensor at an rf-biased electrode in low-pressure plasma

M Bogdanova, D Lopaev, S Zyryanov… - Bulletin of the American …, 2016 - APS
APS -69th Annual Gaseous Electronics Conference - Event - Virtual IED sensor at an rf-biased
electrode in low-pressure plasma American Physical Society American Physical Society …

“Virtual IED sensor” at an rf-biased electrode in low-pressure plasma

MA Bogdanova, SM Zyryanov, DV Lopaev… - Physics of Plasmas, 2016 - osti.gov
Energy distribution and the flux of the ions coming on a surface are considered as the key-
parameters in anisotropic plasma etching. Since direct ion energy distribution (IED) …

[引用][C] “Virtual IED sensor” at an rf-biased electrode in low-pressure plasma

MA Bogdanova, DV Lopaev, SM Zyryanov… - Physics of …, 2016 - cir.nii.ac.jp
“Virtual IED sensor” at an rf-biased electrode in low-pressure plasma | CiNii Research CiNii
国立情報学研究所 学術情報ナビゲータ[サイニィ] 詳細へ移動 検索フォームへ移動 論文・データを …

Virtual IED sensor at an rf-biased electrode in low-pressure plasma

M Bogdanova, D Lopaev, S Zyryanov… - Bulletin of the American …, 2016 - APS
APS -69th Annual Gaseous Electronics Conference - Event - Virtual IED sensor at an rf-biased
electrode in low-pressure plasma American Physical Society American Physical Society …