[HTML][HTML] Three-dimensional measurements of fundamental plasma parameters in pulsed ICP operation
J Han, P Pribyl, W Gekelman, A Paterson - Physics of Plasmas, 2020 - pubs.aip.org
Radio frequency inductively coupled plasma sources are widely used in low temperature
industrial processing. Recent computer simulations and experiments indicate significant …
industrial processing. Recent computer simulations and experiments indicate significant …
Three-dimensional measurements of fundamental plasma parameters in pulsed ICP operation
J Han - Bulletin of the American Physical Society, 2019 - APS
Radio frequency inductively coupled plasma sources are widely used in low temperature
industrial processing. Having reached a limit in process improvement available with steady …
industrial processing. Having reached a limit in process improvement available with steady …
Three-dimensional measurements of fundamental plasma parameters in pulsed ICP operation
J Han, P Pribyl, W Gekelman, A Paterson - Physics of Plasmas, 2020 - osti.gov
Radio frequency inductively coupled plasma sources are widely used in low temperature
industrial processing. Recent computer simulations and experiments indicate significant …
industrial processing. Recent computer simulations and experiments indicate significant …
Three-dimensional measurements of fundamental plasma parameters in pulsed ICP operation
J Han, P Pribyl, W Gekelman, A Paterson - Physics of Plasmas, 2020 - pubs.aip.org
Radio frequency inductively coupled plasma sources are widely used in low temperature
industrial processing. Recent computer simulations and experiments indicate significant …
industrial processing. Recent computer simulations and experiments indicate significant …
Three-Dimensional Measurements of Fundamental Plasma Parameters in Pulsed ICP Operation
J Han, P Pribyl, W Gekelman… - 2020 IEEE International …, 2020 - ieeexplore.ieee.org
Radio frequency inductively coupled plasma sources are widely used in low temperature
industrial processing. Having reached a limit in process improvement available with steady …
industrial processing. Having reached a limit in process improvement available with steady …
Three Dimensional Langmuir Probe Measurements of Fundamental Plasma Parameters in Pulsed ICP Operation
J Han, P Pribyl, W Gekelman - APS Annual Gaseous …, 2019 - ui.adsabs.harvard.edu
Radio frequency plasma sources are widely used in low temperature industrial processing.
Inductively coupled plasma (ICP) is an example, where plasma is generated by a stove-top …
Inductively coupled plasma (ICP) is an example, where plasma is generated by a stove-top …
Three-dimensional measurements of fundamental plasma parameters in pulsed ICP operation
J Han - APS Division of Plasma Physics Meeting Abstracts, 2019 - ui.adsabs.harvard.edu
Radio frequency inductively coupled plasma sources are widely used in low temperature
industrial processing. Having reached a limit in process improvement available with steady …
industrial processing. Having reached a limit in process improvement available with steady …
Three-dimensional measurements of fundamental plasma parameters in pulsed ICP operation
J Han - Bulletin of the American Physical Society, 2019 - APS
Radio frequency inductively coupled plasma sources are widely used in low temperature
industrial processing. Having reached a limit in process improvement available with steady …
industrial processing. Having reached a limit in process improvement available with steady …