Investigation of stochastic heating and its influence on plasma radial uniformity in biased inductively coupled Ar discharges by hybrid simulation
JW Huang, ML Zhao, YR Zhang, F Gao… - Physics of Plasmas, 2023 - pubs.aip.org
A bias power is usually applied in inductively coupled plasmas (ICP) to realize the separate
control of the plasma density and the ion energy. In this research, a two-dimensional …
control of the plasma density and the ion energy. In this research, a two-dimensional …
Investigation of stochastic heating and its influence on plasma radial uniformity in biased inductively coupled Ar discharges by hybrid simulation
JW Huang, ML Zhao, YR Zhang, F Gao… - Physics of Plasmas, 2023 - pubs.aip.org
ABSTRACT A bias power is usually applied in inductively coupled plasmas (ICP) to realize
the separate control of the plasma density and the ion energy. In this research, a two …
the separate control of the plasma density and the ion energy. In this research, a two …
Investigation of stochastic heating and its influence on plasma radial uniformity in biased inductively coupled Ar discharges by hybrid simulation
JW Huang, ML Zhao, YR Zhang, F Gao… - Physics of …, 2023 - ui.adsabs.harvard.edu
A bias power is usually applied in inductively coupled plasmas (ICP) to realize the separate
control of the plasma density and the ion energy. In this research, a two-dimensional …
control of the plasma density and the ion energy. In this research, a two-dimensional …