ALE smoothness: in and outside semiconductor industry
KJ Kanarik, S Tan, T Lill, M Shen, Y Pan… - US Patent …, 2018 - Google Patents
Methods of etching and smoothening films by exposing to a halogen-containing plasma and
an inert plasma within a bias window in cycles are provided. Methods are suitable for …
an inert plasma within a bias window in cycles are provided. Methods are suitable for …
ALE smoothness: in and outside semiconductor industry
KJ Kanarik, S Tan, T Lill, M Shen, Y Pan… - US Patent …, 2018 - freepatentsonline.com
Methods of etching and smoothening films by exposing to a halogen-containing plasma and
an inert plasma within a bias window in cycles are provided. Methods are suitable for …
an inert plasma within a bias window in cycles are provided. Methods are suitable for …
Ale smoothness: in and outside semiconductor industry
KJ Kanarik, S Tan, T Lill, M Shen, Y Pan… - US Patent App. 15 …, 2017 - Google Patents
Methods of etching and smoothening films by exposing to a halogen-containing plasma and
an inert plasma within a bias window in cycles are provided. Methods are suitable for …
an inert plasma within a bias window in cycles are provided. Methods are suitable for …
ALE SMOOTHNESS: IN AND OUTSIDE SEMICONDUCTOR INDUSTRY
KJ Kanarik, S Tan, T Lill, M Shen… - US Patent App. 15 …, 2017 - freepatentsonline.com
Methods of etching and smoothening films by exposing to a halogen-containing plasma and
an inert plasma within a bias window in cycles are provided. Methods are suitable for …
an inert plasma within a bias window in cycles are provided. Methods are suitable for …