抄録< jats: p> Undoped p-type GaAs epilayers were grown by low-pressure metalorganic chemical vapor deposition (MOCVD) at 650 C and 76 Torr using either arsine or …
Carbon acceptor incorporation in GaAs grown by metalorganic chemical vapor deposition : arsine versus tertiarybutylarsine CNRS Inist Pascal-Francis CNRS Pascal and Francis …
Undoped p-type GaAs epilayers were grown by low-pressure metalorganic chemical vapor deposition (MOCVD) at 650 C and 76 Torr using either arsine or tertiarybutylarsine (TBA) …
SP Watkins, G Haacke - Appl. Phys. Lett, 1991 - pubs.aip.org
Undoped p-type GaAs epilayers were grown by low-pressure metalorganic chemical vapor deposition (MOCVD) at 650 “C and 76 Torr using either amine or tertiarybutylarsine (TBA) …
[引用][C]Carbon acceptor incorporation in GaAs grown by metalorganic chemical vapor deposition: arsine versus tertiarybutylarsine
SP WATKINS, G HAACKE - Applied physics letters, 1991 - American Institute of Physics