Excitation dependent Raman studies of self-seeded grown InN nanoparticles with different carrier concentration
High quality InN nanoparticles are grown using an atmospheric chemical vapour deposition
technique via a self-seeded catalytic approach in the temperature range of 580–650° C. In …
technique via a self-seeded catalytic approach in the temperature range of 580–650° C. In …
Excitation dependent Raman studies of self-seeded grown InN nanoparticles with different carrier concentration
KK Madapu, SR Polaki, S Dhara - arXiv preprint arXiv:1605.03351, 2016 - arxiv.org
High quality InN nanoparticles are grown using atmospheric chemical vapour deposition
technique via a self-seeded catalytic approach in the temperature range of 580 to 650 oC. In …
technique via a self-seeded catalytic approach in the temperature range of 580 to 650 oC. In …
Excitation dependent Raman studies of self-seeded grown InN nanoparticles with different carrier concentration.
KK Madapu, SR Polaki, S Dhara - Physical Chemistry Chemical …, 2016 - europepmc.org
High quality InN nanoparticles are grown using an atmospheric chemical vapour deposition
technique via a self-seeded catalytic approach in the temperature range of 580-650 C. In …
technique via a self-seeded catalytic approach in the temperature range of 580-650 C. In …
Excitation dependent Raman studies of self-seeded grown InN nanoparticles with different carrier concentration
KK Madapu, SR Polaki, S Dhara - Physical Chemistry …, 2016 - ui.adsabs.harvard.edu
High quality InN nanoparticles are grown using atmospheric chemical vapour deposition
technique via a self-seeded catalytic approach in the temperature range of 580 to 650 oC. In …
technique via a self-seeded catalytic approach in the temperature range of 580 to 650 oC. In …
Excitation dependent Raman studies of self-seeded grown InN nanoparticles with different carrier concentration
KK Madapu, SR Polaki, S Dhara - Physical chemistry …, 2016 - pubmed.ncbi.nlm.nih.gov
High quality InN nanoparticles are grown using an atmospheric chemical vapour deposition
technique via a self-seeded catalytic approach in the temperature range of 580-650° C. In …
technique via a self-seeded catalytic approach in the temperature range of 580-650° C. In …