Cobalt etch back
Methods of etching cobalt on substrates are provided. Some methods involve exposing the
substrate to a boron-containing halide gas and an additive, and exposing the substrate to an …
substrate to a boron-containing halide gas and an additive, and exposing the substrate to an …
Cobalt etch back
J Yang, B Zhou, M Shen, T Lill… - US Patent …, 2018 - freepatentsonline.com
Methods of etching cobalt on substrates are provided. Some methods involve exposing the
substrate to a boron-containing halide gas and an additive, and exposing the substrate to an …
substrate to a boron-containing halide gas and an additive, and exposing the substrate to an …
Cobalt etch back
J Yang, B Zhou, M Shen, T Lill… - US Patent App. 14/749,285, 2016 - Google Patents
BACKGROUND 0002 Semiconductor fabrication processes include fab rication of
interconnects to form circuits. Interconnects may be formed with copper, capped by liners …
interconnects to form circuits. Interconnects may be formed with copper, capped by liners …
COBALT ETCH BACK
J Yang, B Zhou, M Shen, T Lill… - US Patent App. 14 …, 2016 - freepatentsonline.com
Methods of etching cobalt on substrates are provided. Some methods involve exposing the
substrate to a boron-containing halide gas and an additive, and exposing the substrate to an …
substrate to a boron-containing halide gas and an additive, and exposing the substrate to an …