Pulsed transfer etching of PS–PDMS block copolymers self-assembled in 193 nm lithography stacks

C Girardot, S Böhme, S Archambault… - … applied materials & …, 2014 - ACS Publications
This work presents the graphoepitaxy of high-χ block copolymers (BCP) in standard industry-
like lithography stacks and their transfer into the silicon substrate The process includes …
被引用次数：35 相关文章

[引用][C] Pulsed transfer etching of PS–PDMS block copolymers self-assembled in 193 nm lithography stacks

C Girardot, S Böhme, S Archambault… - ACS Applied …, 2014 - hal.univ-grenoble-alpes.fr
Pulsed transfer etching of PS–PDMS block copolymers self-assembled in 193 nm lithography
stacks - Université Grenoble Alpes Accéder directement au contenu Documentation FR Se …

[引用][C] Pulsed transfer etching of PS–PDMS block copolymers self-assembled in 193 nm lithography stacks

C Girardot, S Böhme, S Archambault… - ACS Applied Materials …, 2014 - hal.science
Pulsed transfer etching of PS–PDMS block copolymers self-assembled in 193 nm lithography
stacks - Archive ouverte HAL Accéder directement au contenu Documentation FR Français …

[引用][C] Pulsed Transfer Etching of PS–PDMS Block Copolymers Self-Assembled in 193 nm Lithography Stacks

C Girardot, S Böhme, S Archambault… - ACS Applied Materials …, 2014 - cir.nii.ac.jp
Pulsed Transfer Etching of PS–PDMS Block Copolymers Self-Assembled in 193 nm
Lithography Stacks | CiNii Research CiNii 国立情報学研究所 学術情報ナビゲータ[サイニィ] 詳細へ …

Pulsed transfer etching of PS-PDMS block copolymers self-assembled in 193 nm lithography stacks

C Girardot, S Böhme, S Archambault… - … applied materials & …, 2014 - pubmed.ncbi.nlm.nih.gov
This work presents the graphoepitaxy of high-χ block copolymers (BCP) in standard industry-
like lithography stacks and their transfer into the silicon substrate The process includes …

Pulsed transfer etching of PS-PDMS block copolymers self-assembled in 193 nm lithography stacks.

C Girardot, S Böhme, S Archambault… - … Applied Materials & …, 2014 - europepmc.org
This work presents the graphoepitaxy of high-χ block copolymers (BCP) in standard industry-
like lithography stacks and their transfer into the silicon substrate The process includes …

[引用][C] Pulsed transfer etching of PS–PDMS block copolymers self-assembled in 193 nm lithography stacks

C Girardot, S Böhme, S Archambault… - ACS Applied …, 2014 - hal.univ-grenoble-alpes.fr
Pulsed transfer etching of PS–PDMS block copolymers self-assembled in 193 nm lithography
stacks - Université Grenoble Alpes Accéder directement au contenu Documentation FR Se …