Optimization of overshoot in the pulsed radio frequency inductively coupled argon plasma by step waveform modulation

XY Lv, QZ Zhang, K Jiang, F Gao… - Journal of Applied Physics, 2023 - pubs.aip.org
The pulsed inductively coupled plasma (ICP) has considerable potential to satisfy multiple
stringent scaling requirements for use in the semiconductor industry. However, overshoot of …
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Optimization of overshoot in the pulsed radio frequency inductively coupled argon plasma by step waveform modulation

XY Lv, QZ Zhang, K Jiang, F Gao… - Journal of Applied …, 2023 - ui.adsabs.harvard.edu
The pulsed inductively coupled plasma (ICP) has considerable potential to satisfy multiple
stringent scaling requirements for use in the semiconductor industry. However, overshoot of …

Optimization of overshoot in the pulsed radio frequency inductively coupled argon plasma by step waveform modulation

XY Lv, QZ Zhang, K Jiang, F Gao… - Journal of Applied Physics, 2023 - pubs.aip.org
The pulsed inductively coupled plasma (ICP) has considerable potential to satisfy multiple
stringent scaling requirements for use in the semiconductor industry. However, overshoot of …