Dry-etching processes for high-aspect-ratio features with sub-10 nm resolution high-χ block copolymers

G Pound-Lana, P Bézard, C Petit-Etienne… - … Applied Materials & …, 2021 - ACS Publications
Directed self-assembly of block copolymers (BCP) is a very attractive technique for the
realization of functional nanostructures at high resolution. In this work, we developed full dry …
被引用次数：12 相关文章

Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block Copolymers

G Pound-Lana, P Bézard… - … applied materials & …, 2021 - pubmed.ncbi.nlm.nih.gov
Directed self-assembly of block copolymers (BCP) is a very attractive technique for the
realization of functional nanostructures at high resolution. In this work, we developed full dry …

Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block Copolymers.

G Pound-Lana, P Bézard, C Petit-Etienne… - … Applied Materials & …, 2021 - europepmc.org
Directed self-assembly of block copolymers (BCP) is a very attractive technique for the
realization of functional nanostructures at high resolution. In this work, we developed full dry …

Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block Copolymers

G Pound-Lana, P Bézard, C Petit-Etienne… - ACS Applied Materials …, 2021 - hal.science
Directed self-assembly of block copolymers (BCP) is a very attractive technique for the
realization of functional nanostructures at high resolution. In this work, we developed full dry …

[引用][C] Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block Copolymers

G Pound-Lana, P Bézard, C Petit-Etienne… - ACS Applied Materials …, 2021 - cir.nii.ac.jp
Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ
Block Copolymers | CiNii Research CiNii 国立情報学研究所 学術情報ナビゲータ[サイニィ] 詳細へ …
[PDF] imec-publications.be

[PDF][PDF] Dry-etching processes for high aspect-ratio features with sub-10 nm resolution high-χ block copolymers

G Pound-Lana, P Bézard, C Petit-Etienne, S Cavalaglio… - imec-publications.be
Directed self-assembly of block copolymers (BCP) is a very attractive technique for the
realization of functional nanostructures at high resolution. In this work, we developed full dry …
[PDF] hal.science

[PDF][PDF] Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block Copolymers

G Pound-Lana, P Bézard, C Petit-Etienne, S Cavalaglio… - hal.science
Directed self-assembly of block copolymers (BCP) is a very attractive technique for the
realization of functional nanostructures at high resolution. In this work, we developed full dry …
[PDF] imec-publications.be

[PDF][PDF] Dry-etching processes for high aspect-ratio features with sub-10 nm resolution high-χ block copolymers

G Pound-Lana, P Bézard, C Petit-Etienne, S Cavalaglio… - imec-publications.be
Directed self-assembly of block copolymers (BCP) is a very attractive technique for the
realization of functional nanostructures at high resolution. In this work, we developed full dry …

[引用][C] Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block Copolymers

G Pound-Lana, P Bézard, C Petit-Etienne, S Cavalaglio… - 2021