Surface roughening and rippling during plasma etching of silicon: Numerical investigations and a comparison with experiments

H Tsuda, N Nakazaki, Y Takao, K Eriguchi… - Journal of Vacuum …, 2014 - pubs.aip.org
Atomic-or nanometer-scale surface roughening and rippling during Si etching in high-
density Cl 2 and Cl 2/O 2 plasmas have been investigated by developing a three …
被引用次数：32 相关文章
[PDF] archive.org

[PDF][PDF] Surface roughening and rippling during plasma etching of silicon: Numerical investigations and a comparison with experiments

H Tsuda, N Nakazaki, Y Takao… - Journal of Vacuum …, 2014 - scholar.archive.org
Atomic-or nanometer-scale surface roughening and rippling during Si etching in high-
density Cl2 and Cl2/O2 plasmas have been investigated by developing a three-dimensional …

Surface roughening and rippling during plasma etching of silicon: Numerical investigations and a comparison with experiments

H Tsuda, N Nakazaki, Y Takao, K Eriguchi… - Journal of Vacuum …, 2014 - pubs.aip.org
Atomic-or nanometer-scale surface roughening and rippling during Si etching in high-
density Cl2 and Cl2/O2 plasmas have been investigated by developing a three-dimensional …
[PDF] kyoto-u.ac.jp

[PDF][PDF] Surface roughening and rippling during plasma etching of silicon: Numerical investigations and a comparison with experiments

H Tsuda, N Nakazaki, Y Takao… - Journal of Vacuum …, 2014 - repository.kulib.kyoto-u.ac.jp
Atomic-or nanometer-scale surface roughening and rippling during Si etching in high-
density Cl2 and Cl2/O2 plasmas have been investigated by developing a three-dimensional …

[引用][C] Surface roughening and rippling during plasma etching of silicon: Numerical investigations and a comparison with experiments

H Tsuda, N Nakazaki, Y Takao… - Journal of Vacuum …, 2014 - ui.adsabs.harvard.edu
Surface roughening and rippling during plasma etching of silicon: Numerical investigations and
a comparison with experiments - NASA/ADS Now on home page ads icon ads Enable full ADS …

Surface roughening and rippling during plasma etching of silicon: numerical investigations and a comparison with experiments

H Tsuda, N Nakazaki, Y Takao, K Eriguchi… - Journal of vacuum …, 2014 - cir.nii.ac.jp
抄録 Atomic-or nanometer-scale surface roughening and rippling during Si etching in high-
density Cl2 and Cl2/O2 plasmas have been investigated by developing a three-dimensional …

Surface roughening and rippling during plasma etching of silicon: numerical investigations and a comparison with experiments

H Tsuda, N Nakazaki, Y Takao… - Journal of vacuum …, 2014 - ynu.repo.nii.ac.jp
Atomic-or nanometer-scale surface roughening and rippling during Si etching in high-
density Cl2 and Cl2/O2 plasmas have been investigated by developing a three-dimensional …

Surface roughening and rippling during plasma etching of silicon: numerical investigations and a comparison with experiments

H Tsuda, N Nakazaki, Y Takao… - Journal of vacuum …, 2014 - ynu.repo.nii.ac.jp
Atomic-or nanometer-scale surface roughening and rippling during Si etching in high-
density Cl2 and Cl2/O2 plasmas have been investigated by developing a three-dimensional …

[引用][C] Surface roughening and rippling during plasma etching of silicon: Numerical investigations and a comparison with experiments

H Tsuda, N Nakazaki, Y Takao, K Eriguchi… - Journal of Vacuum …, 2014 - cir.nii.ac.jp
Surface roughening and rippling during plasma etching of silicon: Numerical investigations
and a comparison with experiments | CiNii Research CiNii 国立情報学研究所 学術情報 …