Beyond the highs and lows: A perspective on the future of dielectrics research for nanoelectronic devices

M Jenkins, DZ Austin, JF Conley, J Fan… - ECS Journal of Solid …, 2019 - iopscience.iop.org
High-dielectric constant (high-k) gate oxides and low-dielectric constant (low-k) interlayer
dielectrics (ILD) have dominated the nanoelectronic materials research scene over the past …
被引用次数：26 相关文章

[引用][C] Beyond the highs and lows: A perspective on the future of dielectrics research for nanoelectronic devices

M Jenkins, DZ Austin, JF Conley, J Fan… - ECS Journal of Solid …, 2019 - elibrary.ru

Beyond the highs and lows: A perspective on the future of dielectrics research for nanoelectronic devices

M Jenkins, D Austin, J Conley Jr, J Fan… - ECS Journal of Solid …, 2019 - eprints.soton.ac.uk
High-dielectric constant (high-k) gate oxides and low-dielectric constant (low-k) interlayer
dielectrics (ILD) have dominated the nanoelectronic materials research scene over the past …