Detection of fast electrons in pulsed argon inductively-coupled plasmas using the 420.1–419.8 nm emission line pair

JB Boffard, S Wang, CC Lin… - Plasma Sources Science …, 2015 - iopscience.iop.org
Pulsed rf plasmas exhibit many differences as compared to continuous wave plasmas with
the same average power levels, including large temporal variations in the electron …
被引用次数：22 相关文章
[PDF] cyberleninka.org

[PDF][PDF] Detection of fast electrons in pulsed argon inductively-coupled plasmas using the 420.1–419.8 nm emission line pair

JB Boffard, S Wang, CC Lin… - Plasma Sources Sci …, 2015 - cyberleninka.org
Pulsed rf plasmas exhibit many differences as compared to continuous wave plasmas with
the same average power levels, including large temporal variations in the electron …

[引用][C] Detection of fast electrons in pulsed argon inductively-coupled plasmas using the 420.1–419.8 nm emission line pair

JB Boffard, S Wang, CC Lin, AE Wendt - Plasma Sources Science and …, 2015 - cir.nii.ac.jp
Detection of fast electrons in pulsed argon inductively-coupled plasmas using the 420.1–419.8
nm emission line pair | CiNii Research CiNii 国立情報学研究所 学術情報ナビゲータ[サイニィ] 詳細 …

Detection of fast electrons in pulsed argon inductively-coupled plasmas using the 420.1-419.8 nm emission line pair

JB Boffard, S Wang, CC Lin… - Plasma Sources …, 2015 - ui.adsabs.harvard.edu
Pulsed rf plasmas exhibit many differences as compared to continuous wave plasmas with
the same average power levels, including large temporal variations in the electron …

Detection of fast electrons in pulsed argon inductively-coupled plasmas using the 420.1–419.8 nm emission line pair

JB Boffard, CC Lin, S Wang, AE Wendt - Plasma Sources Science and …, 2015 - inis.iaea.org
[en] Pulsed rf plasmas exhibit many differences as compared to continuous wave plasmas
with the same average power levels, including large temporal variations in the electron …

[引用][C] Detection of fast electrons in pulsed argon inductively-coupled plasmas using the 420.1–419.8 nm emission line pair

JB Boffard, S Wang, CC Lin, AE Wendt - Plasma Sources Science and …, 2015 - par.nsf.gov