Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch)

KJ Kanarik, J Marks, H Singh, S Tan… - US Patent …, 2017 - Google Patents
Methods are provided for integrating atomic layer etch and atomic layer deposition by
performing both processes in the same chamber or reactor. Methods involve sequentially …
被引用次数：40 相关文章

Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch)

KJ Kanarik, J Marks, H Singh, S Tan… - US Patent …, 2017 - freepatentsonline.com
Methods are provided for integrating atomic layer etch and atomic layer deposition by
performing both processes in the same chamber or reactor. Methods involve sequentially …

Integrating atomic scale processes: ald (atomic layer deposition) and ale (atomic layer etch)

KJ Kanarik, J Marks, H Singh, S Tan… - US Patent App. 15 …, 2017 - Google Patents
BACKGROUND 0002. As feature sizes shrink, there is a growing need for atomic scale
processing Such as Atomic Layer Deposition (ALD) and Atomic Layer Etch (ALE). ALD and …

INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) AND ALE (ATOMIC LAYER ETCH)

KJ Kanarik, J Marks, H Singh, S Tan… - US Patent App. 15 …, 2017 - freepatentsonline.com
Methods are provided for integrating atomic layer etch and atomic layer deposition by
performing both processes in the same chamber or reactor. Methods involve sequentially …