DJ Economou - Journal of Physics. D, Applied Physics, 2014 - osti.gov
Pulsed plasma etching for semiconductor manufacturing (Journal Article) | OSTI.GOV skip to main content Sign In Create Account Show search Show menu OSTI.GOV title logo US …
DJ Economou - J. Phys. D: Appl. Phys, 2014 - chee.uh.edu
Power-modulated (pulsed) plasmas have demonstrated several advantages compared to continuous wave (CW) plasmas. Specifically, pulsed plasmas can result in a higher etching …
DJ Economou - Journal of Physics. D, Applied Physics, 2014 - inis.iaea.org
[en] Power-modulated (pulsed) plasmas have demonstrated several advantages compared to continuous wave (CW) plasmas. Specifically, pulsed plasmas can result in a higher …
DJ Economou - J. Phys. D: Appl. Phys, 2014 - che.uh.edu
Power-modulated (pulsed) plasmas have demonstrated several advantages compared to continuous wave (CW) plasmas. Specifically, pulsed plasmas can result in a higher etching …
DJ Economou - Journal of Physics D Applied Physics, 2014 - ui.adsabs.harvard.edu
Power-modulated (pulsed) plasmas have demonstrated several advantages compared to continuous wave (CW) plasmas. Specifically, pulsed plasmas can result in a higher etching …
DJ Economou - J. Phys. D: Appl. Phys, 2014 - chee.uh.edu
Power-modulated (pulsed) plasmas have demonstrated several advantages compared to continuous wave (CW) plasmas. Specifically, pulsed plasmas can result in a higher etching …