A global model has been developed for low-pressure (3–20 mTorr), radio-frequency
(rf)(13.56 MHz) inductively coupled plasmas (ICPs), produced in SF 6/Ar mixtures. The …

The F-atom kinetics in SF 6 and SF 6/Ar inductively coupled plasmas (ICPs) were
investigated using a global model. This report particularly focuses on the effects of ICP …

Sulfur hexafluoride (SF 6) gas or Ar/SF 6 mixing gas is widely used in plasma processes.
However, there are a little experimental studies with various external parameters such as …

This research concerns the experimental and theoretical analysis of an SF/sub 6/radio-
frequency (RF) discharge at low pressure in a small reactor for industrial applications. The …

Abstract Large-size, low-pressure, and high-density inductive plasma discharges operated
with argon and SF 6 gas mixtures are studied experimentally and numerically modelled. The …

Measurements using a Langmuir probe and optical emission spectroscopy combined with
actinometry are carried out in inductively coupled CF 4/O 2/Ar discharges at total pressures …

Neutral gas temperature (T g) is measured in an industrial high-density inductively coupled
etch reactor operating in CF 4⁠, SF 6⁠, O 2⁠, Cl 2⁠, or HBr plasmas. Two laser diodes are …

A global model has been developed for low-pressure, inductively coupled plasma (ICP) SF
6/O 2/Ar mixtures. This model is based on a set of mass balance equations for all the …

A hybrid model, called the hybrid plasma equipment model, was used to study inductively
coupled SF 6 plasmas used for Si etching applications. The plasma properties such as …

The chemistry of high-density SF 6 plasma discharges is not well characterized. In this
article, a combination of computational modeling and experimental diagnostics has been …