The angle-resolved Mueller matrix polarimetry has been recently introduced for dimensional
metrology of nanoscale structures. Due to the redundant information contained in the …

Recently, ellipsometry-based scatterometry has gained more and more attention in
semiconductor manufacturing. Among the various types of ellipsometry, Mueller matrix …

This paper presents the modeling and simulation of Mueller matrix polarimetry for
nanostructure metrology, with an emphasis on the sensitivity analysis. Taking a two …

Recently, the surface profiles of nanostructures have been reduced in size in order to
develop microfabrication techniques, such as lithography and nanoimprinting. In particular …

Mueller matrix ellipsometry has been demonstrated as a powerful tool for nanostructure
metrology in high-volume manufacturing. Many factors may induce depolarization effect in …

Mueller matrix ellipsometry (MME) provides the 4× 4 Mueller matrix of a sample under test,
which determines how the state of polarization is changed as light interacts with the sample …

Many diverse applications rely on lithography at the nanoscale, including semiconductor
devices, biological probes, solar energy harvesting, spectroscopy and smart materials. The …

The increasing interest in miniaturizing semiconductor components and nanostructure
materials has pushed for improved material characterization. One way to characterize a …

This study uses a Mueller matrix polarimeter, which is based on a scatterometry technique,
to evaluate the surface profiles of nanostructures. A nanostructure profile is determined from …

Mueller matrix ellipsometry on advanced nanostructures diva-portal.org Digitala Vetenskapliga
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