Directed self-assembly of block copolymers (BCP) is a very attractive technique for the
realization of functional nanostructures at high resolution. In this work, we developed full dry …

Block copolymer (BC) self-assembly constitutes a powerful platform for nanolithography.
However, there is a need for a general approach to BC lithography that critically considers …

Block copolymer lithography is a promising approach to massively parallel, high-resolution,
and low-cost patterning, but the inherently low etch resistance of polymers has limited its …

This work presents the graphoepitaxy of high-χ block copolymers (BCP) in standard industry-
like lithography stacks and their transfer into the silicon substrate The process includes …

The directed self-assembly (DSA) of block co-polymers (BCPs) can realize next-generation
lithography for semiconductors and a variety of soft materials. It is imperative to …

The directed self-assembly (DSA) of block copolymers (BCPs) is a promising next-
generation lithography technique for high-resolution patterning. However, achieving …

The self-assembly of ultra-high molecular weight (UHMW) block copolymers (BCPs) remains
a complex and time-consuming endeavor owing to the high kinetic penalties associated with …

The self-assembly of block copolymers (BCPs) has attracted considerable attention because
it can effectively generate highly ordered nanostructures through a simple and cost-effective …

We accomplished truly scalable, low cost, arbitrarily large-area block copolymer lithography,
synergistically integrating the two principles of graphoepitaxy and epitaxial self-assembly …

Self-organizing block copolymer thin films hold promise as a photolithography enhancement
material for the 22-nm microelectronics technology generation and beyond, primarily …