This work presents the graphoepitaxy of high-χ block copolymers (BCP) in standard industry-
like lithography stacks and their transfer into the silicon substrate The process includes …

Block copolymer (BC) self-assembly constitutes a powerful platform for nanolithography.
However, there is a need for a general approach to BC lithography that critically considers …

Block copolymers (BCP) are highly promising self-assembling precursors for scalable
nanolithography. Very regular BCP nanopatterns can be used as on-chip etch masks. The …

Directed self-assembly (DSA) of block copolymers (BCPs) is an advanced patterning
technique being investigated to obtain small and dense patterns for future technological …

Next‐generation lithography techniques based on the self‐assembly of block copolymers
(BCPs) are promising methods for high‐resolution pattering. BCPs with a high …

A promising alternative for the next-generation lithography is based on the directed self-
assembly of block copolymers (BCPs) used as a bottom-up tool for the definition of …

The directed self-assembly (DSA) of block copolymers (BCPs) is a promising next-
generation lithography technique for high-resolution patterning. However, achieving …

The directed self-assembly (DSA) of block co-polymers (BCPs) can realize next-generation
lithography for semiconductors and a variety of soft materials. It is imperative to …

Directed self-assembly of block copolymers (BCP) is a very attractive technique for the
realization of functional nanostructures at high resolution. In this work, we developed full dry …

The continuous demand for small portable electronics is pushing the semiconductor industry
to develop novel lithographic methods to fabricate the elementary structures for …