In this paper, mask-free silicon underetching process was first applied in the analysis of
shape formation of single crystal silicon (SCS) nanopore fabricated by three-step wet …

This paper presents an improved three-step wet etching method for the fabrication of single-
crystal silicon nanopores and nanoslists. A diffusion model was built to analyze the influence …

Silicon nanopores were successfully fabricated by wet anisotropic etching method. The
minimum feature sizes of square and rectangular nanopores were 33 nm and 6 nm …

This paper presents an improved wet etching method for the massive production of silicon
nanopore arrays. The shape (length-width ratio) of the nanopore can be easily tuned by …

Solid-state nanopore arrays are realized with a well-controlled, three-step, anisotropic wet
etching process with different KOH bath temperatures. The influence of etchant …

Solid-state nanopores with controllable pore size and morphology have huge application
potential. However, it has been very challenging to process sub-10 nm silicon nanopore …

This paper presents a novel method for the fabrication of silicon nanopore arrays. The
proposed method is based on inductive coupled plasma (ICP) etching and a two-step …

Inverted-pyramid silicon nanopore arrays are realized with a well-controlled, three-step,
anisotropic wet etching process with different KOH bath temperatures. The influence of …

A cost effective method to fabricate nanopores in silicon by only using the conventional wet-
etching technique is developed in this research. The main concept of the proposed method …

In this paper, pyramidal notch array was pre-etched on P (100) silicon wafer using
anisotropic wet chemical etching, then macro-pore/pillar array were successfully processed …