This research investigates the improvements of ozone (O3) annealing on the optical and
etching characteristics of TiO2/Al2O3 multilayer band-pass filters designed for potential …

Optical filters operating in the visible region of the spectrum are highly desired for
applications ranging from optical communication and sensing to fluorescence microscopy …

In order to develop an alternate high-k and low-loss dielectric material for high density
energy storage and gate oxide applications and to address the leakage current issues in …

Ultrathin TiO 2/Al 2 O 3 stacking structures were fabricated using an atomic layer deposition
technique. The effect of the ultrathin Al 2 O 3 interlayer on interfacial thermal stability and …

The authors show here that the passivation quality of Al 2 O 3 is highly sensitive to the
surface condition prior to the atomic layer deposition, affecting especially the thermal …

Mixed metal oxides provide a convenient means to produce coatings with tailored physical
properties. We investigate the possibility of synthesizing novel coatings of mixed titanium …

Optimizing the atomic layer deposition (ALD) process of films is particularly important in
preparing multilayer interference films. In this work, a series of Al_2O_3/TiO_2 nano …

Atomic-layer-deposited alumina (ALD Al2O3) can be utilized for passivation, structural, and
functional purposes in electronics. In all cases, the deposited film is usually expected to …

Extensive research has been conducted on UV photodetectors employing metal oxide thin
films, which exhibit numerous advantageous qualities, notably encompassing current …

The chemical, structural, morphological, and optical properties of Al-doped TiO2 thin films,
called TiO2/Al2O3 nanolaminates, grown by plasma-enhanced atomic layer deposition …