Electron beam induced current microscopy of silicon p–n junctions in a scanning transmission electron microscope

AP Conlan, G Moldovan, L Bruas, E Monroy… - Journal of Applied …, 2021 - pubs.aip.org
A silicon pn junction has been mapped using electron beam induced current in both a
scanning transmission electron microscope (STEM) and a conventional scanning electron …

Simulations of the electrostatic potential distribution in a TEM sample of a semiconductor device

PK Somodi, RE Dunin-Borkowski… - Microscopy of …, 2018 - taylorfrancis.com
Simulations of the electrostatic potential in a thin sample that contains a single Si pn junction
have been carried out in order to examine the effect of different boundary conditions at the …

Electron‐beam‐induced current images of sectioned p/n junctions in silicon: Influence of surface states at low acceleration voltages

R Kuhnert - Journal of applied physics, 1991 - pubs.aip.org
On cross sections through semiconductor devices, the electron‐beam‐induced current
(EBIC) mode of the scanning electron microscope yields two‐dimensional information on the …

Quantitative electron holography of biased semiconductor devices

AC Twitchett, RE Dunin-Borkowski, PA Midgley - Physical review letters, 2002 - APS
Electron holography is used to measure electrostatic potential profiles across reverse-
biased Si p− n junctions in situ in the transmission electron microscope. A novel sample …

Off-axis electron holography of unbiased and reverse-biased focused ion beam milled Si pn junctions

AC Twitchett, RE Dunin-Borkowski… - Microscopy and …, 2005 - cambridge.org
Off-axis electron holography is used to measure electrostatic potential profiles across a
silicon pn junction, which has been prepared for examination in the transmission electron …

Internal Electric Field Profiling of 2D PN Junctions of Semiconductor Devices by 4D STEM and Dual Lens Electron Holography

YY Wang, R Yuan, S Wang, Z Wang, Q Jin - Microscopy today, 2022 - academic.oup.com
The internal electric field of a 2D PN junction of a semiconductor is mapped out by two
techniques: measuring the deflection of the transmitted beam in micro-STEM mode with …

Off‐axis electron holography of electrostatic potentials in unbiased and reverse biased focused ion beam milled semiconductor devices

AC Twitchett, RE Dunin‐Borkowski… - Journal of …, 2004 - Wiley Online Library
Off‐axis electron holography in the transmission electron microscope (TEM) is used to
measure two‐dimensional electrostatic potentials in both unbiased and reverse biased …

Three-dimensional electrostatic potential of a Si pn junction revealed using tomographic electron holography

AC Twitchett, TJV Yates… - Journal of Physics …, 2006 - iopscience.iop.org
Off-axis electron holography and tomography have been combined to examine the 3-D
electrostatic potential associated with a thin specimen containing a Si pn junction. The …

High-resolution scanning near-field EBIC microscopy: Application to the characterisation of a shallow ion implanted p+–n silicon junction

K Smaali, J Fauré, A El Hdiy, M Troyon - Ultramicroscopy, 2008 - Elsevier
High-resolution electron beam induced current (EBIC) analyses were carried out on a
shallow ion implanted p+–n silicon junction in a scanning electron microscope (SEM) and a …

Finite element simulations of electrostatic dopant potentials in thin semiconductor specimens for electron holography

PK Somodi, AC Twitchett-Harrison, PA Midgley… - Ultramicroscopy, 2013 - Elsevier
Two-dimensional finite element simulations of electrostatic dopant potentials in parallel-
sided semiconductor specimens that contain p–n junctions are used to assess the effect of …