Graphene is the first engineering electronic material, which is purely two-dimensional: it
consists of two exposed sp 2-hybridized carbon surfaces and has no bulk. Therefore …

The polymer residues still present on a chemical vapour-deposited graphene surface after
its wet transfer by the poly (methyl methacrylate) method to the arbitrary substrates, tend to …

It is known that graphene surface contaminations by residues affect drastically its intrinsic
properties and cannot be avoided when chemical vapor deposited (CVD) graphene is …

The impact on the electronic and structural properties of chemical vapor deposition (CVD)
graphene transferred onto SiO2/silicon (Si) of continuous H2-based plasmas, used to …

We report a novel cleaning technique for few-layer graphene (FLG) by using inductively
coupled plasma (ICP) of Ar with an extremely low plasma density of 3.5× 108 cm–3. It is …

We demonstrate modulated H 2 and O 2 plasma treatments as an effective methodology for
controlled chemical functionalization by hydrogen and oxygen atoms of single-and multi …

In this work, covalent modification of mono-and bilayer graphene is achieved using
tetrafluoromethane (CF 4), oxygen and hydrogen RF plasma. Controlled modification of …

Graphene as a promising 2D material has been widely studied due to its unique properties.
Transferring CVD graphene to other substrates from its original metal foil is important for its …

The clean removal of a poly (methyl methacrylate)(PMMA) film on graphene has been an
essential part of the process of transferring chemical vapor deposited graphene to a specific …

To assist the development of plasma processes to pattern graphene in a controlled way,
interactions between hydrogen plasma species (H, H+, H 2+) and various types of graphene …