The ion beam sputtering (IBS) of smooth mono-elemental Si with impurity co-deposition is
extended to a pre-rippled binary compound surface of fused silica (SiO 2). The dependence …

The morphology evolution of self-organized nanopatterns induced during Arþ ion
bombardment (IB) with Mo co-deposition on fused silica (SiO2) surfaces at different …

In this work results, about the formation of topography and roughness induced by secondary
ion mass spectrometry ion beam sputtering of single crystal (100) germanium surfaces are …

We report on the production of nanoscale patterning on Si substrates by low-energy ion-
beam sputtering. The surface morphology and structure of the irradiated surface were …

We examined the dependence of smoothing or roughening behavior on the initial surface
roughness of single crystal Si. An atomically flat cleaved Si surface of roughness 0.038 nm …

We investigate the incorporation of iron atoms during nano-patterning of Si surfaces induced
by 2keV Kr+ ion beam erosion under an off-normal incidence angle of 15°. Considering the …

Grazing incidence small-angle x-ray scattering and atomic force microscopy have been
used to systematically investigate the evolution of Si (100) surface morphology during …

The morphology of different amorphous or amorphized SiO 2 surfaces, including thermally
grown films, fused silica, and single crystalline quartz, during low energy ion sputtering has …

Ultrasmooth surfaces with sub-nanometer roughness and low damage are a great challenge
for optical fabrication. Ion beam sputtering (IBS) has obvious advantages on the …

We report here the influence of initial surface roughness on the development of ion induced
Si surface morphology. Surfaces of different initial roughness have been generated …