Optical lithography with high numerical aperture has a significant modulation effect on the
polarization state of the light field, which affects the imaging quality of the system. Due to the …

The influence of polarization on the image performance of optical lithography systems has
been systematically investigated through comparing the image contrast and the process …

Polarization aberration of projection optics should be measured, controlled and
compensated accurately in high numericalaperture image optical system, such as …

An imaging polarimeter is developed for measuring polarization properties of hyper number
aperture (NA) lithography tools, which can be represented by stokes entrance-pupil, stokes …

It will be required for more accurate lithography simulation of complicated mask patterns
then ever, under hyper-NA (numerical aperture) projection lens and aggressive small …

As resolution of lithography becomes narrower, the illumination mode affects imaging more
significantly. Correct illumination mode can improve resolution. Element theorems of …

Since 193 nm is a practical wavelength, high numerical aperture (NA) technology of the ArF
lithography is one of the remaining ways for further improvement of the resolution. For high …

Optical lithography has approached a regime of high numerical aperture and wide field,
where the impact of polarization aberration on imaging quality turns to be serious. Most of …

As a new kind of optical imaging technology, polarimetric imaging can be able to identify the
target that may be difficult to conventional ones and can reduce the influence of stray and …

As the numerical aperture (NA) of 193nm immersion lithography projection optics (PO)
increasing, polarization aberration (PA) leads to image quality degradation seriously. PA …