MoS2 Transistors with Low Schottky Barrier Contact by Optimizing the Interfacial Layer Thickness

J Cheng, J He, C Pu, C Liu, X Huang, D Zhang, H Yan… - Energies, 2022 - mdpi.com
Molybdenum disulfide (MoS2) has attracted great attention from researchers because of its
large band gap, good mechanical toughness and stable physical properties; it has become …

High-performance MoS2 transistors with low-resistance molybdenum contacts

J Kang, W Liu, K Banerjee - Applied Physics Letters, 2014 - pubs.aip.org
In this Letter, molybdenum (Mo) is introduced and evaluated as an alternative contact metal
to atomically-thin molybdenum disulphide (MoS 2), and high-performance field-effect …

Contact resistance reduction in MoS2 FETs using ultra-thin TiO2 interfacial layers

N Kaushik, A Nipane, S Karande… - 2015 73rd Annual …, 2015 - ieeexplore.ieee.org
High contact resistance (RC) at metal-Molybdenum disulfide (MoS 2) interface obscures the
intrinsic transport properties of MoS 2 [1] and limits its potential as a channel material for …

Study on the resistance distribution at the contact between molybdenum disulfide and metals

Y Guo, Y Han, J Li, A Xiang, X Wei, S Gao, Q Chen - ACS nano, 2014 - ACS Publications
Contact resistance hinders the high performance of electrical devices, especially devices
based on two-dimensional (2D) materials, such as graphene and transition metal …

The intrinsic interface properties of the top and edge 1T/2H MoS2 contact: A first-principles study

HF Bai, LC Xu, MY Di, LY Hao, Z Yang… - Journal of Applied …, 2018 - pubs.aip.org
The promised performance of monolayer molybdenum disulfide (MoS 2)-based devices is
hindered by the high electrical resistance at the metal-MoS 2 contact. Benefitting from the …

Improved Contacts and Device Performance in MoS2 Transistors Using a 2D Semiconductor Interlayer

K Andrews, A Bowman, U Rijal, PY Chen, Z Zhou - ACS nano, 2020 - ACS Publications
We report a contact engineering method to minimize the Schottky barrier height (SBH) and
contact resistivity of MoS2 field-effect transistors (FETs) by using ultrathin 2D …

Schottky Barrier Height Engineering for Electrical Contacts of Multilayered MoS2 Transistors with Reduction of Metal-Induced Gap States

GS Kim, SH Kim, J Park, KH Han, J Kim, HY Yu - ACS nano, 2018 - ACS Publications
The difficulty in Schottky barrier height (SBH) control arising from Fermi-level pinning (FLP)
at electrical contacts is a bottleneck in designing high-performance nanoscale electronics …

Switching mechanism in single-layer molybdenum disulfide transistors: An insight into current flow across Schottky barriers

H Liu, M Si, Y Deng, AT Neal, Y Du, S Najmaei… - ACS …, 2014 - ACS Publications
In this article, we study the properties of metal contacts to single-layer molybdenum disulfide
(MoS2) crystals, revealing the nature of switching mechanism in MoS2 transistors. On …

Stable MoS2 Field‐Effect Transistors Using TiO2 Interfacial Layer at Metal/MoS2 Contact (Phys. Status Solidi A 12∕2017)

W Park, JW Min, SF Shaikh… - physica status solidi (a …, 2017 - Wiley Online Library
As the physical scaling of traditional silicon CMOS devices is gradually approaching its
physical limit, molybdenum disulfide (MoS2) having a two-dimensional atomic-layered …

Comparative Study on Electronic Structures of Sc and Ti Contacts with Monolayer and Multilayer MoS2

Z Li, X Li, J Yang - ACS Applied Materials & Interfaces, 2015 - ACS Publications
Understanding the nature of the contacts in devices based on MoS2 with metal electrodes is
vital to enhancing carrier injection efficiency. In this work, geometric and electronic structures …