Pulsed plasmas have emerged as promising candidates as a means for precise control of
ion energy/angle dependent surface processes and surface chemistry during the plasma …

Pulsed plasmas are important for the fabrication of nanoscale features. Source biasing is
generally associated with the control of the ion to radical flux ratio; how the ion energy …

The pulsed inductively coupled plasma (ICP) has considerable potential to satisfy multiple
stringent scaling requirements for use in the semiconductor industry. However, overshoot of …

This article reports the results of time-resolved measurements of ion energy distributions
(IEDs), relative ion densities, as well as optical emissions and electrical characteristics in …

The electrical and plasma parameters of a low pressure inductively coupled argon plasma
are investigated over a wide range of parameters (RF power, flow rate and pressure) by …

Time-dependent studies of pulsed inductively coupled Ar and Ar/CF 4 discharges are
presented in this work. By using a time-resolved power diagnosis system, ie, a Langmuir …

Changing the RF bias is widely used to control the ion energy in inductively coupled plasma
(ICP). Here, the plasma densities were measured using the floating harmonic method at …

The time evolution of ion energy distributions (IEDs) during the afterglow is measured in
various inert gas plasmas generated by an inductively coupled plasma source. The …

Changes in the ion flux and the time-averaged ion distribution functions are reported for
pulsed, inductively coupled RF plasmas (ICPs) operated over a range of duty cycles. For …

The plasma characteristics of pulse-modulated, radio frequency (RF) power in an inductively
coupled plasma discharge were investigated. A two-dimensional axisymmetric structure was …