Magnetron sputtering was used to prepare nanocrystalline Molybdenum (Mo) films with a
thickness (h) ranging from 200 to 1000 nm. Transmission Electron Microscope, Scanning …

The authors report on the microstructure, crystallography, and mechanical properties of size
controlled nanocrystalline (nc) molybdenum (Mo) films deposited by sputtering. The nc‐Mo …

We find direct evidence of stain driven phase transition from face centered cubic (FCC) to
body centered cubic (BCC) structure in radio frequency (RF) sputtered molybdenum (Mo) …

Molybdenum (Mo), which is one among the refractory metals, is a promising material with a
wide variety of technological applications in microelectronics, optoelectronics, and energy …

In this work, the effects of the DC sputter conditions on the microstructure, morphology,
topography, and adhesion of molybdenum (Mo) thin films deposited over graphite were …

A combined investigation of mechanical stress generation by in situ substrate curvature
measurements during the growth of MoNx thin films, with 0≤ x≤ 0.35, and of structural …

Molybdenum is a refractory metal with many special properties, including excellent high
temperature tensile and creep strength, low coefficient of thermal expansion and high …

The size dependent hardness and strain-rate sensitivity of magnetron sputtered
nanocrystalline Mo thin films with film thickness h ranging from 250 to 2000 nm were …

In this study, the critical role of substrate bias during sputter deposition of Mo thin films is
discussed. Two sets of Mo thin films having a nominal thickness of 300 nm were prepared at …

Sputter-deposited metallic thin films are attractive materials for micromechanics but they
suffer from large stress variations within the batch or even a single wafer. The origin of such …