Physical aspects of the pulsed laser deposition technique: The stoichiometric transfer of material from target to film

J Schou - Applied Surface Science, 2009 - Elsevier
The physical processes of pulsed laser deposition (PLD) change strongly from the initial
light absorption in a target to the final deposition and growth of a film. One of the primary …

Pulsed laser deposition (PLD)--a versatile thin film technique

HU Krebs, M Weisheit, J Faupel, E Süske… - Advances in solid state …, 2003 - Springer
Pulsed laser deposition (PLD) is for many reasons a versatile technique. Since with this
method the energy source is located outside the chamber, the use of ultrahigh vacuum …

Large‐area pulsed laser deposition: Techniques and applications

JA Greer, MD Tabat - Journal of Vacuum Science & Technology A …, 1995 - pubs.aip.org
Pulsed laser deposition (PLD) has quickly emerged as a unique tool with which to grow high
quality films of complex chemical compounds. It is estimated that at present the number of …

Pulsed laser deposition history and laser-target interactions

J Cheung, J Horwitz - MRS bulletin, 1992 - Springer
The laser, as a source of “pure” energy in the form of monochromatic and coherent photons,
is enjoying ever increasing popularity in diverse and broad applications from drilling micron …

Pulsed laser deposition of metal and metal multilayer films

JG Lunney - Applied surface science, 1995 - Elsevier
Pulsed laser deposition is a highly flexible technique for the fabrication of thin films, and can
in principle be applied to all solid materials including metals, refractory metals and rare …

Pulsed Laser Deposition of Complex Materials: Progress

DR NORTON - Pulsed laser deposition of thin films: applications …, 2007 - books.google.com
In experimental science, it is a rare thing for a newly discovered (or rediscovered) synthesis
technique to immediately deliver both enhanced performance and simplicity in use in a field …

[图书][B] Pulsed laser deposition of thin films: applications-led growth of functional materials

R Eason - 2007 - books.google.com
Edited by major contributors to the field, this text summarizes current or newly emerging
pulsed laser deposition application areas. It spans the field of optical devices, electronic …

Gas dynamics and film profiles in pulsed-laser deposition of materials

SI Anisimov, D Bäuerle, BS Luk'Yanchuk - Physical Review B, 1993 - APS
Film-thickness profiles obtained in pulsed-laser deposition are calculated by using the well-
known solution of the gas-dynamic equations which describes the expansion of the plasma …

Pulsed laser ablation and deposition of thin films

MNR Ashfold, F Claeyssens, GM Fuge… - Chemical Society …, 2004 - pubs.rsc.org
Pulsed laser ablation is a simple, but versatile, experimental method that finds use as a
means of patterning a very diverse range of materials, and in wide areas of thin film …

Influence of inert gas pressure on deposition rate during pulsed laser deposition

T Scharf, HU Krebs - Applied Physics A, 2002 - Springer
The deposition rates of permalloy and Ag are monitored during pulsed laser deposition in
different inert gas atmospheres. Under ultrahigh vacuum conditions, resputtering from the …