Comparisons between measurements and spatially-averaged (0D) simulations of low-
pressure Ar and Cl 2 pulsed-plasmas in an industrial inductively coupled reactor are …

Quantifying transient phenomena such as pulsed operation is important to optimizing
plasma materials processing. In particular, pulsed electronegative plasmas are promising …

Radio frequency inductively coupled plasma sources are widely used in low temperature
industrial processing. Recent computer simulations and experiments indicate significant …

Comparisons of 2D fluid simulations with experimental measurements of Ar/Cl 2 plasmas in
a low-pressure inductively coupled reactor are reported. Simulations show that the wall …

Inductively coupled plasma reactors are now one of the most important of the high-density
plasma processing tools that have been developed in recent years. We present results from …

A two-dimensional self-consistent simulation of a miniaturized inductively coupled plasma
(mICP) reactor was developed. The coupled equations for plasma power deposition …

Electrophysical and kinetic characteristics of Cl 2/Ar plasma were investigated to understand
the influence of the addition of Ar on the volume densities and fluxes of active particles, both …

Large scale numerical simulations of the spatiotemporal plasma flow in low‐pressure (0.1–1
Torr) radio‐frequency capacitively coupled reactors were performed using a global plasma …

A global kinetic model of Cl 2/Ar/N 2 plasma discharge has been developed, which allows
calculation of the densities and fluxes of all neutral and charged species considered in the …

A two-dimensional fluid model is used to study an industrial Ar/Cl 2 inductively coupled
plasma discharge designed to etch III-V samples. The effect of rf power, gas pressure, and …