Method of forming an enhanced unexposed photoresist layer
JW Maes, KK Kachel, DK De Roest - US Patent 11,022,879, 2021 - Google Patents
The method relates to a method of forming an enhanced unexposed photoresist layer from
an unexposed photoresist layer on a substrate by increasing the sensitivity of the unexposed …
an unexposed photoresist layer on a substrate by increasing the sensitivity of the unexposed …
Method of forming an enhanced unexposed photoresist layer
JW Maes, KK Kachel, DK De Roest - US Patent App. 17/231,299, 2021 - Google Patents
The method relates to a method of forming an enhanced unexposed photoresist layer from
an unexposed photoresist layer on a substrate by increasing the sensitivity of the unexposed …
an unexposed photoresist layer on a substrate by increasing the sensitivity of the unexposed …
Radiation shielding for a substrate holder
E Shero, M Halpin, J Winkler - US Patent 9,167,625, 2015 - Google Patents
A reaction chamber including a substrate supporting member positioned within the reaction
chamber, the reaction chamber having a first region and a second region, a shield …
chamber, the reaction chamber having a first region and a second region, a shield …
Method and apparatus for filling a recess formed within a substrate surface
V Pore, Z Liu - US Patent 11,227,789, 2022 - Google Patents
There is provided a method of filling one or more recesses by providing the substrate in a
reaction chamber and intro ducing a first reactant to the substrate with a first dose …
reaction chamber and intro ducing a first reactant to the substrate with a first dose …
Method of forming a structure on a substrate
T Blanquart, D De Roest - US Patent 10,784,102, 2020 - Google Patents
The invention relates to a method of providing a structure by depositing a layer on a
substrate in a reactor. The method comprising:
substrate in a reactor. The method comprising:
Method and apparatus for filling a gap
V Pore, W Knaepen, B Jongbloed, D Pierreux… - US Patent …, 2018 - Google Patents
There is provided a method of filling one or more gaps by providing the substrate in a
reaction chamber and introducing a first reactant to the substrate with a first dose, thereby …
reaction chamber and introducing a first reactant to the substrate with a first dose, thereby …
Method and apparatus for filling a gap
V Pore, W Knaepen, B Jongbloed, D Pierreux… - US Patent …, 2017 - Google Patents
According to the invention there is provided a method of filling one or more gaps created
during manufacturing of a feature on a substrate by providing a deposition method …
during manufacturing of a feature on a substrate by providing a deposition method …
Method for supplying gas with flow rate gradient over substrate
D Ishikawa, K Matsushita - US Patent 8,664,627, 2014 - Google Patents
A method for supplying gas over a substrate in a reaction chamber wherein a substrate is
placed on a pedestal, includes: supplying a first gas from a first side of the reaction chamber …
placed on a pedestal, includes: supplying a first gas from a first side of the reaction chamber …
Chamber sealing member
M Halpin, E Shero, C White, F Alokozai… - US Patent …, 2016 - Google Patents
(57) ABSTRACT A reaction chamber including an upper region for processing a Substrate, a
lower region for loading a Substrate, a Susceptor movable within the reaction chamber, a …
lower region for loading a Substrate, a Susceptor movable within the reaction chamber, a …
Reactor precoating for reduced stress and uniform CVD
EAH Timmermans, MJ Teepen, R Mucciato… - US Patent …, 2005 - Google Patents
A method is provided for obtaining stable and elevated deposition rates in a reaction
chamber, following the cleaning of the chamber. The method involves cleaning of the …
chamber, following the cleaning of the chamber. The method involves cleaning of the …