Diese Dissertation setzt sich mit Polarisationseffekten in der hochauflösenden bildgebenden
Metrologie auseinander. Sie greift dabei im Kern auf Konzepte der modellbasierten …

The polarization characteristics of the state-of-art of optical lithography equipment are
approximately ideal, ie, in general only small polarization changes are induced by optical …

When the optical elements of a system are not collinear, there are advantages to aligning all
elements simultaneously. This paper presents the steps taken to prepare for system …

Low pass filtering taking place in the projection tools used by IC industry leads to a range of
optical proximity effects resulting in undesired IC characteristics. To correct these predicable …

The on-axis wavefront aberrations of a one-dimensional subwavelength-grating
antireflection coating on an f/1.7 lens surface are shown to be small with noticeable …

The technique of calculation of polarization aberrations with the help of the method of
polarizationwave matrices is proposed. Radiation is represented as a coherent set of the …

As scanner projection lens captures only a finite number of IC pattern diffraction orders. This
low pass filtering leads to a range of optical proximity effects such as pitch-dependent CD …

Предложена методика расчета поляризационных аберраций с помощью метода
поляризационно-волновых матриц. Излучение представляется когерентной …