We study pull-in instabilities in a functionally graded microelectromechanical system (MEMS) due to the heat produced by the electric current. Material properties of two-phase …
JM Hartmann, F Andrieu, D Lafond, T Ernst… - Materials Science and …, 2008 - Elsevier
We have first of all quantified the impact of pressure on Si and SiGe growth kinetics. Definite growth rate and Ge concentration increases with the pressure have been evidenced at low …
T Schroeder, P Zaumseil, O Seifarth… - New Journal of …, 2008 - iopscience.iop.org
The integration of alternative semiconductor layers on the Si material platform via oxide heterostructures is of interest to increase the performance and/or functionality of future Si …
E Kasper - Applied surface science, 2008 - Elsevier
Silicon germanium (SiGe) is lattice mismatched to silicon by up to 4% depending on its Ge content. Basic investigations on strained layer growth, interface properties and deviation …
This research focuses on the design and analysis of on-chip phased-array receivers and transmitters in silicon technologies. Passive phase shifters have been widely used in …
Bandgap-engineered SiGe HBTs are fully-Si-manufacturing compatible, and can be fabricated in a BiCMOS platform on 200 mm wafers at high yield. SiGe HBTs are capable of …
Since 1995, when IBM's commercial silicon-germanium (SiGe) BiCMOS process emerged at the Bipolar/BiCMOS Circuits and Technology Meeting [NHM+95, AFS+97], SiGe-based …
The primary incentives for developing a more accurate understanding of charge carrier dynamics are presented in this chapter. The fundamentals of the SiGe HBT and SiGe …
J Chen, Y Qiao - Metallurgical and Materials Transactions A, 2008 - Springer
The behavior of cleavage crack fronts at grain boundaries in free-standing silicon thin films is investigated through a microtensile experiment. In addition to the crystallographic …