Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursors
D Padhi, S Park, G Balasubramanian… - US Patent …, 2010 - Google Patents
A method of forming a graded dielectric layer on an underlying layer including flowing a
mixture of a silicon-carbon containing gas, an oxygen containing gas and a carrier gas …
mixture of a silicon-carbon containing gas, an oxygen containing gas and a carrier gas …