Second harmonic generation in AlGaAs photonic wires using low power continuous wave light
D Duchesne, KA Rutkowska, M Volatier, F Légaré… - Optics express, 2011 - opg.optica.org
We report modal phase matched (MPM) second harmonic generation (SHG) in high-index
contrast AlGaAs sub-micron ridge waveguides, by way of sub-mW continuous wave powers …
contrast AlGaAs sub-micron ridge waveguides, by way of sub-mW continuous wave powers …
Optical frequency conversion in integrated devices
We review our recent progress on frequency conversion in integrated devices, focusing
primarily on experiments based on strip-loaded and quantum-well intermixed AlGaAs …
primarily on experiments based on strip-loaded and quantum-well intermixed AlGaAs …
[PDF][PDF] Second harmonic generation in AlGaAs nanowaveguides
K Rutkowska, D Duchesne, M Volatier… - … Physica Polonica A, 2011 - bibliotekanauki.pl
In this paper, we investigate semiconductor nanowaveguides (ie ridge waveguides with core-
widths narrower than 1 μm) intended to act as novel optical light sources through nonlinear …
widths narrower than 1 μm) intended to act as novel optical light sources through nonlinear …
GaAs/AlGaAs 多层膜刻蚀的陡直度
罗跃川， 韩尚君， 王雪敏， 吴卫东， 唐永建 - 信息与电子工程, 2011 - cqvip.com
GaAs/AlGaAs 多层膜的陡直度较大程度地关系到其实际应用效果, 但在实际加工中较难控制,
因此有必要研究刻蚀过程中一些主要因素对其陡直度的影响. 结合具体工作情况, 用AZ1500 …
因此有必要研究刻蚀过程中一些主要因素对其陡直度的影响. 结合具体工作情况, 用AZ1500 …
Inductively coupled plasma etching of high aspect ratio two-dimensional photonic crystals in Al-rich AlGaAs and AlGaAsSb
A Larrue, D Belharet, P Dubreuil, S Bonnefont… - Journal of Vacuum …, 2011 - pubs.aip.org
Planar two-dimensional photonic crystals are key tools for the development of advanced
optoelectronic devices. However, their practical realization often requires deep etching of air …
optoelectronic devices. However, their practical realization often requires deep etching of air …
High-aspect-ratio inductively coupled plasma etching of InP using SiH4/Cl2: Avoiding the effect of electrode coverplate material
L Gatilova, S Bouchoule, S Guilet… - Journal of Vacuum …, 2011 - pubs.aip.org
A new SiH 4/Cl 2 chemistry is proposed for the high-aspect-ratio etching of InP-based
heterostructures. Anisotropic etching is obtained through the deposition of a SiO x …
heterostructures. Anisotropic etching is obtained through the deposition of a SiO x …
[PDF][PDF] Integrated ultrasonic-photonic devices
ECS Barretto, JM Hvam, K Yvind, M van der Poel - 2011 - orbit.dtu.dk
This thesis presents research carried out from September 2007 to February 2010 in the
Department of Photonics Engineering, at the Technical University of Denmark. This PhD …
Department of Photonics Engineering, at the Technical University of Denmark. This PhD …
Self-aligned mask renewal for anisotropically etched circular micro-and nanostructures
P Kaspar, S Holzapfel, EJ Windhab… - … of Micromechanics and …, 2011 - iopscience.iop.org
The top–down fabrication of high aspect ratio circular micro-and nanostructures in silicon
nitride is presented. A new method is introduced to increase the aspect ratio of …
nitride is presented. A new method is introduced to increase the aspect ratio of …
Extending Plasmonics in Semiconductors to Higher Operating Frequencies
HMK Wong - 2011 - library-archives.canada.ca
Abstract<? Pub Inc> This thesis examines the feasibility of using conventional
semiconductors, specifically'GaAs', as a plasmonic material at the operating wavelength of …
semiconductors, specifically'GaAs', as a plasmonic material at the operating wavelength of …
Contrôle optique et électrique de réflectivité THz assistée par phonon-polaritons de surface
S Vassant - 2011 - theses.fr
Résumé Le travail de thèse porte sur la conception et la réalisation de deux modulateurs
optiques assistés par phonon-polaritons de surface fonctionnant en réflectivité, autour de …
optiques assistés par phonon-polaritons de surface fonctionnant en réflectivité, autour de …