Model of a low-pressure radio-frequency inductive discharge in Ar/O2 used for plasma spray deposition
C Lazzaroni, K Baba, M Nikravech… - Journal of Physics D …, 2012 - iopscience.iop.org
A global (volume-averaged) model of a low-pressure radio-frequency (RF) inductive
discharge used for nanostructured zinc oxide thin film deposition, the so-called spray …
discharge used for nanostructured zinc oxide thin film deposition, the so-called spray …
Concept of Spatially-divided Deep Reactive Ion Etching of Si using oxide atomic layer deposition in the passivation cycle
F Roozeboom, B Kniknie, R Knaapen… - 2012 4th Electronic …, 2012 - ieeexplore.ieee.org
Conventional Deep Reactive Ion Etching (DRIE) is a plasma etch process with alternating
half-cycles of 1) Si-etching with SF 6 to form gaseous SiF x etch products, and 2) passivation …
half-cycles of 1) Si-etching with SF 6 to form gaseous SiF x etch products, and 2) passivation …