Pulsed plasma etching for semiconductor manufacturing
DJ Economou - Journal of Physics D: Applied Physics, 2014 - iopscience.iop.org
Power-modulated (pulsed) plasmas have demonstrated several advantages compared to
continuous wave (CW) plasmas. Specifically, pulsed plasmas can result in a higher etching …
continuous wave (CW) plasmas. Specifically, pulsed plasmas can result in a higher etching …
Time-resolved ion flux, electron temperature and plasma density measurements in a pulsed Ar plasma using a capacitively coupled planar probe
M Darnon, G Cunge… - Plasma Sources Science …, 2014 - iopscience.iop.org
The resurgence of industrial interest in pulsed radiofrequency plasmas for etching
applications highlights the fact that these plasmas are much less well characterized than …
applications highlights the fact that these plasmas are much less well characterized than …
Pulsed Cl2/Ar inductively coupled plasma processing: 0D model versus experiments
E Despiau-Pujo, M Brihoum, P Bodart… - Journal of Physics D …, 2014 - iopscience.iop.org
Comparisons between measurements and spatially-averaged (0D) simulations of low-
pressure Ar and Cl 2 pulsed-plasmas in an industrial inductively coupled reactor are …
pressure Ar and Cl 2 pulsed-plasmas in an industrial inductively coupled reactor are …
Directed self-assembly of PS-b-PDMS into 193nm photoresist patterns and transfer into silicon by plasma etching
S Archambault, C Girardot, M Salaün… - … Etch Technology for …, 2014 - spiedigitallibrary.org
Block CoPolymer (BCP) self-assembly creates periodical patterns with feature sizes
eventually below 10 nm. On plain substrates, ordering is only obtained in grains not larger …
eventually below 10 nm. On plain substrates, ordering is only obtained in grains not larger …