Dry efficient cleaning of poly-methyl-methacrylate residues from graphene with high-density H2 and H2-N2 plasmas

G Cunge, D Ferrah, C Petit-Etienne… - Journal of Applied …, 2015 - pubs.aip.org
Graphene is the first engineering electronic material, which is purely two-dimensional: it
consists of two exposed sp 2-hybridized carbon surfaces and has no bulk. Therefore …

Detection of fast electrons in pulsed argon inductively-coupled plasmas using the 420.1–419.8 nm emission line pair

JB Boffard, S Wang, CC Lin… - Plasma Sources Science …, 2015 - iopscience.iop.org
Pulsed rf plasmas exhibit many differences as compared to continuous wave plasmas with
the same average power levels, including large temporal variations in the electron …

Silicon etching in a pulsed HBr/O2 plasma. I. Ion flux and energy analysis

M Haass, M Darnon, G Cunge, O Joubert… - Journal of Vacuum …, 2015 - pubs.aip.org
The ion flux and ion velocity distribution function are studied using a capacitively coupled
radio frequency ion flux probe and a multigrid retarding field analyzer in an HBr/O 2 pulsed …

Particle energy distributions and metastable atoms in transient low pressure interpulse microwave plasma

S Pandey, DN Patel, AR Baitha… - … Sources Science and …, 2015 - iopscience.iop.org
The electron energies and its distribution function are measured in non-equilibrium transient
pulsed microwave plasmas in the interpulse regime using a retarding field electron energy …

Vers une gravure plasma de precision nanometrique: Simulations de dynamique moleculaire en chimie Si-Cl

P Brichon - 2015 - theses.hal.science
Ce travail de thèse aborde le problème de la gravure de matériaux ultraminces pour la
réalisation de nouvelles générations de transistors (FDSOI, FinFET) dans les dispositifs …