Methods of etching metal by depositing a material reactive with a metal to be etched and a
halogen to form a volatile species and exposing the substrate to a halogen-containing gas …

Methods are provided for integrating atomic layer etch and atomic layer deposition by
performing both processes in the same chamber or reactor. Methods involve sequentially …

US9837312B1 - Atomic layer etching for enhanced bottom-up feature fill - Google Patents
US9837312B1 - Atomic layer etching for enhanced bottom-up feature fill - Google Patents Atomic …

Provided is a method for etching an etching target layer of a workpiece. The workpiece has a
mask on the etching target layer. The etching target layer and the mask are formed from …

A method of magnetic tunnel junction patterning for magnetoresistive random access
memory devices using low atomic weight ion sputtering. The method includes: providing a …

In a plasma etching method of plasma-etching a sample which has a first magnetic film, a
second magnetic film disposed above the first magnetic film, a metal oxide film disposed …