Masking coating formation by the focused ion beams method for plasma chemical treatment
IN Kots, VS Klimin, VV Polyakova… - Journal of Physics …, 2018 - iopscience.iop.org
The application of the focused ion beams method makes it possible to obtain modified
surfaces serving as a masking layer for subsequent processing of semiconductor materials …
surfaces serving as a masking layer for subsequent processing of semiconductor materials …