[HTML][HTML] Three-dimensional measurements of fundamental plasma parameters in pulsed ICP operation
J Han, P Pribyl, W Gekelman, A Paterson - Physics of Plasmas, 2020 - pubs.aip.org
Radio frequency inductively coupled plasma sources are widely used in low temperature
industrial processing. Recent computer simulations and experiments indicate significant …
industrial processing. Recent computer simulations and experiments indicate significant …
Transients using low-high pulsed power in inductively coupled plasmas
C Qu, SK Nam, MJ Kushner - Plasma Sources Science and …, 2020 - iopscience.iop.org
Pulsed inductively coupled plasmas (ICPs) are widely deployed in the fabrication of
semiconductor devices. Pulse repetition frequencies of up to tens of kHz are commonly used …
semiconductor devices. Pulse repetition frequencies of up to tens of kHz are commonly used …
Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
M Hirayama, A Teramoto, S Sugawa - Journal of Vacuum Science & …, 2020 - pubs.aip.org
The effects of low-energy (< 15 eV) high-flux O 2+ ion bombardment on the properties of Al 2
O 3 films deposited on 3D nanostructures by plasma-enhanced atomic layer deposition (PE …
O 3 films deposited on 3D nanostructures by plasma-enhanced atomic layer deposition (PE …
[图书][B] Study of Fundamental Plasma Properties in an Inductively Coupled Plasma Device
J Han - 2020 - search.proquest.com
Radio frequency inductively coupled plasma sources are widely used in low temperature
industrial processing. Recent computer simulations and experiments indicate significant …
industrial processing. Recent computer simulations and experiments indicate significant …