The scientific study of plasma discharges and their material interactions has been crucial to
the development of semiconductor process engineering and, by extension, the entire …

Phase resolved optical emission spectroscopy (PROES) measurements were combined with
measurements of the optical emission intensity (OEI) and electrical characteristics (RF …

The effect of the pulse-off duration on the time evolution of the plasma and electrical
parameters during the ignition phase in a pulsed capacitively coupled radio frequency argon …

A synergistic combination of multi-diagnostic methods are proposed to investigate temporal
evolution of electrical and plasma parameters at various radial positions over 300 mm …

The experimental and theoretical study of radiofrequency capacitively coupled plasma
discharge afterglow has been carried out. Temporal dynamics of Ar metastable and …

Electron temperature is measured from time resolved hairpin resonator probe
measurements in a pulsed capacitively coupled argon plasma at 400 mTorr. Effective …

In low-temperature Ar/H 2 discharge used for material processing, the main factor
influencing the film quality is the active species responsible for surface reactions, such as …

A novel experimental technique for sidewall analysis of plasma-etched nano-patterns using
tilted X-ray photoelectron spectroscopy (XPS) combined with in-situ ion sputtering was …

Plasma parameters (electron density, electron temperature and relative light intensity) often
follow an unstable state at the initial pulse stage in pulsed radio frequency discharges. For …

We show that etching of a dielectric (quartz) target by ions from the beam-plasma formed
using a forevacuum-pressure, plasma-cathode electron source is substantially greater when …