Two classic radio-frequency (RF) plasmas, ie, the capacitively and the inductively coupled
plasmas (CCP and ICP), are widely employed in material processing, eg, etching and thin …

InGaZnO (IGZO)-based thin-film transistors and selector diodes are increasingly investigated
for a broad range of applications such as high-resolution displays, high-density memories …

The etch characteristics of silicon trenches masked with various SiO 2/Si 3 N 4 pattern
distances were investigated using synchronously and asynchronously pulse modes in …

The effects of gas pressure and voltage amplitude on the ignition process of a pulse
capacitively coupled RF argon discharge are experimentally investigated. The electron …

Low-temperature plasmas have seen increasing use for synthesizing high-quality, mono-
disperse nanoparticles (NPs). Recent work has highlighted that an important process in NP …

We present measurements of the time evolution of plasma and electrical parameters in a
pulsed capacitively coupled argon discharge operated at a radio frequency of 12.5 MHz …

Pulsed plasmas have emerged as promising candidates as a means for precise control of
ion energy/angle dependent surface processes and surface chemistry during the plasma …

The etching of HfO 2 and ZrO 2 high-k dielectrics is studied using plasma enhanced atomic
layer etching. The etching method relies on a continuous argon inductively coupled plasma …

The Korea Atomic Energy Research Institute has recently proposed and developed a novel
cesium-free negative hydrogen/deuterium ion source system based on two pulsed plasma …

Crisis in coronavirus times requires understanding the effects on society and establishing
efficient mechanisms to prevent infections. The disinfection of personal protection equipment …