Plasma-controlled surface wettability: Recent advances and future applications

C Ma, A Nikiforov, D Hegemann… - International …, 2023 - Taylor & Francis
Materials with the desirable surface wettability are of key importance in diverse applications.
However, most of the existing chemical processes used for surface wettability control are …

[HTML][HTML] Surface antibacterial properties enhanced through engineered textures and surface roughness: A review

I Georgakopoulos-Soares, EL Papazoglou… - Colloids and Surfaces B …, 2023 - Elsevier
The spread of bacteria through contaminated surfaces is a major issue in healthcare, food
industry, and other economic sectors. The widespread use of antibiotics is not a sustainable …

Physico-chemical and mechanical properties of coir-coconut husk reinforced LDPE composites: influence of long term acid ageing

DO Obada, KA Salami, AN Oyedeji, FU Ocheme… - Iranian Polymer …, 2023 - Springer
This work investigates the physical, chemical, and mechanical properties of coir-coconut
husk powder reinforced low-density polyethylene composites exposed to an aggressive …

Modeling of plasma processing reactors: review and perspective

S Rauf, K Bera, J Kenney… - Journal of Micro …, 2023 - spiedigitallibrary.org
Low temperature plasmas (LTPs) are widely used in the semiconductor industry to etch,
deposit, modify, and pattern thin films during the fabrication of integrated circuits. Modeling …

Plasma Etch Equipment

Y Pu - Handbook of Integrated Circuit Industry, 2023 - Springer
This chapter begins with a brief overview of the plasma etching principle, equipment
categorization, and their applications. A total of 11 typical plasma etch techniques and …

Modulation of the plasma radial uniformity in pulsed dual-antenna inductively coupled plasmas

C Lu, JW Huang, YR Zhang, F Gao, YN Wang - Physics of Plasmas, 2023 - pubs.aip.org
Pulse modulation in inductively coupled plasmas (ICPs) has been proven as an effective
method not only to restrain the charging effect in etching trenches but also as a potential …

Optimization of overshoot in the pulsed radio frequency inductively coupled argon plasma by step waveform modulation

XY Lv, QZ Zhang, K Jiang, F Gao… - Journal of Applied Physics, 2023 - pubs.aip.org
The pulsed inductively coupled plasma (ICP) has considerable potential to satisfy multiple
stringent scaling requirements for use in the semiconductor industry. However, overshoot of …

Raman scattering monitoring of thin film materials for atomic layer etching/deposition in the nano-semiconductor process integration

JB Kim, DS Kim, JS Kim, JH Choe, DW Ahn… - Chemical Physics …, 2023 - pubs.aip.org
According to Moore's law, the semiconductor industry is experiencing certain challenges in
terms of adapting to highly sophisticated integrated technology. Therefore, controlling …

Effect of initial-learning dataset on etching profile optimization using machine learning in plasma etching

T Dobashi, H Kobayashi, Y Okuyama… - Japanese Journal of …, 2023 - iopscience.iop.org
Abstract Machine learning (ML) was applied to optimize the etching profile for a line and
space pattern sample in plasma etching. To investigate the effect of different initial-learning …

Breakdown modes of capacitively coupled plasma II: unsustainable discharges

H Wu, R An, D Zhong, W Jiang, Y Zhang - arXiv preprint arXiv:2312.05458, 2023 - arxiv.org
In this work, the one-dimensional implicit particle-in-cell/Monte-Carlo collision code
(PIC/MCC) is used to study the discharge of a capacitively coupled plasma (CCP) under …