Dry etching of epitaxial InGaAs/InAlAs/InAlGaAs structures for fabrication of photonic integrated circuits
SA Nazib, TA Hutchins-Delgado, A Sharma… - Optical Materials …, 2024 - opg.optica.org
A dry etching process to transfer the pattern of a photonic integrated circuit design for high-
speed laser communications is described. The laser stack under consideration is a 3.2-µm …
speed laser communications is described. The laser stack under consideration is a 3.2-µm …
5-axis CNC micro-milling machine for three-dimensional microfluidics
M Modarelli, D Kot-Thompson, K Hoshino - bioRxiv, 2024 - biorxiv.org
The gold standard of microfluidic fabrication techniques, SU-8 patterning, requires
photolithography equipment and facilities and is not suitable for 3D microfluidics. A 3D …
photolithography equipment and facilities and is not suitable for 3D microfluidics. A 3D …
Diffusion-Driven Charge Transport in III–V Optoelectronic Devices
A Myllynen - 2024 - aaltodoc.aalto.fi
Optoelectronics that seamlessly convert electrical energy to optical energy and vice versa
have irreversibly changed our everyday lives through, eg, the ubiquitous light-emitting …
have irreversibly changed our everyday lives through, eg, the ubiquitous light-emitting …
Deep ICP-RIE etched trenches with sidewall slope control of GaAs-based high power 905nm pulsed laser diodes
The micro-fabrication process for advanced GaAs-based Pulsed Laser Diodes (PLDs)
necessitates the precise etching of trenches for patterning waveguides. Traditionally, we …
necessitates the precise etching of trenches for patterning waveguides. Traditionally, we …