Directed self-assembly of block copolymers: a tutorial review of strategies for enabling nanotechnology with soft matter

H Hu, M Gopinadhan, CO Osuji - Soft matter, 2014 - pubs.rsc.org
Self-assembly of soft materials is broadly considered an attractive means of generating
nanoscale structures and patterns over large areas. However, the spontaneous formation of …

[HTML][HTML] Self-assembly of block copolymer thin films

JNL Albert, TH Epps III - Materials Today, 2010 - Elsevier
Block copolymers self-assemble on nanometer length scales, making them ideal for
emerging nanotechnologies. Many applications (eg, templating, membranes) require the …

50th Anniversary Perspective: Polymer Brushes: Novel Surfaces for Future Materials

WL Chen, R Cordero, H Tran, CK Ober - Macromolecules, 2017 - ACS Publications
Polymer brushes have become a significant focus of polymer research with the need for
straightforward and versatile surface modification. With the development of controlled radical …

Polarity-switching top coats enable orientation of sub–10-nm block copolymer domains

CM Bates, T Seshimo, MJ Maher, WJ Durand… - Science, 2012 - science.org
Block copolymers (BCPs) must necessarily have high interaction parameters (χ), a
fundamental measure of block incompatibility, to self-assemble into sub–10-nanometer …

Ordering in thin films of block copolymers: Fundamentals to potential applications

IW Hamley - Progress in polymer science, 2009 - Elsevier
The ordering of block copolymers in thin films is reviewed, starting from the fundamental
principles and extending to recent promising developments as templates for …

Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication

S Ji, L Wan, CC Liu, PF Nealey - Progress in Polymer Science, 2016 - Elsevier
Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically defined
chemically nanopatterned surfaces (or chemical patterns) combines advantages of …

Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat

HS Suh, DH Kim, P Moni, S Xiong, LE Ocola… - Nature …, 2017 - nature.com
Directed self-assembly (DSA) of the domain structure in block copolymer (BCP) thin films is
a promising approach for sub-10-nm surface patterning. DSA requires the control of …

A facile synthesis of dynamic, shape‐changing polymer particles

D Klinger, CX Wang, LA Connal, DJ Audus… - Angewandte …, 2014 - Wiley Online Library
We herein report a new facile strategy to ellipsoidal block copolymer nanoparticles that
exhibit a pH‐triggered anistropic swelling profile. In a first step, elongated particles with an …

Design of high‐χ block copolymers for lithography

WJ Durand, G Blachut, MJ Maher… - Journal of Polymer …, 2015 - Wiley Online Library
This report describes the design and synthesis of a series of lamella‐forming, silicon‐
containing block copolymers (Si‐BCPs) and evaluation of these materials as potential …

Designing high χ copolymer materials for nanotechnology applications: A systematic bulk vs. thin films approach

PP Angelopoulou, I Moutsios, GM Manesi… - Progress in Polymer …, 2022 - Elsevier
This review article discusses the origins of self-assembly behavior of linear and non-linear
block co-and terpolymers and their application towards the fabrication of high-resolution …