[HTML][HTML] Ferroelectric materials for neuroinspired computing applications

D Wang, S Hao, B Dkhil, B Tian, C Duan - Fundamental Research, 2023 - Elsevier
In recent years, the emergence of numerous applications of artificial intelligence (AI) has
sparked a new technological revolution. These applications include facial recognition …

Hafnium oxide-based ferroelectric devices for in-memory computing: resistive and capacitive approaches

M Lee, DM Narayan, JH Kim, DN Le… - ACS Applied …, 2024 - ACS Publications
The integration of ferroelectric hafnium oxide (HfO2) into semiconductor device structures
has been a breakthrough in the development of state-of-the-art in-memory computing (IMC) …

High-speed emerging memories for AI hardware accelerators

A Lu, J Lee, TH Kim, MAU Karim, RS Park… - Nature Reviews …, 2024 - nature.com
Applications of artificial intelligence (AI) necessitate AI hardware accelerators able to
efficiently process data-intensive and computation-intensive AI workloads. AI accelerators …

Enhanced Switching Reliability of Hf0.5Zr0.5O2 Ferroelectric Films Induced by Interface Engineering

F Huang, B Saini, Z Yu, C Yoo, V Thampy… - … Applied Materials & …, 2023 - ACS Publications
Ferroelectric materials have been widely researched for applications in memory and energy
storage. Among these materials and benefiting from their excellent chemical compatibility …

Giant energy storage and power density negative capacitance superlattices

SS Cheema, N Shanker, SL Hsu, J Schaadt, NM Ellis… - Nature, 2024 - nature.com
Dielectric electrostatic capacitors1, due to their ultrafast charge-discharge capability, are
attractive for high power energy storage applications. Along with ultrafast operation, on-chip …

3D Vertical Ferroelectric Capacitors with Excellent Scalability

E Lim, Y Park, C Youn, S Kim - Nano Letters, 2025 - ACS Publications
Three-dimensional vertically stacked memory is more cost-effective than two-dimensional
stacked memory. Vertically stacked memory using ferroelectric materials has great potential …

Direct growth of ferroelectric orthorhombic ZrO 2 on Ru by atomic layer deposition at 300° C

M Ko, JS Park, S Joo, S Hong, JM Yuk, KM Kim - Materials Horizons, 2025 - pubs.rsc.org
Fluorite-structured binary oxide ferroelectrics exhibit robust ferroelectricity at a thickness
below 10 nm, making them highly scalable and applicable for high-end semiconductor …

[HTML][HTML] Simultaneously achieving high-κ and strong ferroelectricity in Hf0. 5Zr0. 5O2 thin film by structural stacking design

Y Wang, J Li, H Zhu, H Bu, X Du, S Shen, Y Yin… - Journal of Materiomics, 2025 - Elsevier
The superior dielectric and ferroelectric properties of HfO 2-based thin films, coupled with
excellent silicon compatibility, position them as highly attractive candidates for dynamic and …

Progress of emerging non-volatile memory technologies in industry

M Hellenbrand, I Teck, JL MacManus-Driscoll - MRS communications, 2024 - Springer
This prospective and performance summary provides a view on the state of the art of
emerging non-volatile memory (eNVM) in the semiconductor industry. The overarching aim …

Integration of ferroelectric hfo2 onto a iii-v nanowire platform

AEO Persson - 2023 - portal.research.lu.se
The discovery of ferroelectricity in CMOS-compatible oxides, such as doped hafnium oxide,
has opened new possibilities for electronics by reviving the use of ferroelectric …